Silicon Monoxide Sputtering Targets (SiO)
| Material Type | Silicon (II) Oxide |
| Symbol | SiO |
| Melting Point (°C) | >1,702 |
| Theoretical Density (g/cc) | 2.13 |
| Z Ratio | 0.87 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
| Comments | For resistance evaporation, use baffle box and low rate. |
Silicon Monoxide Sputtering Targets
Silicon monoxide is the chemical compound with the formula SiO where silicon is present in the oxidation state +2. In the vapor phase, it is a diatomic molecule.
Silicon Monoxide Sputtering Targets Information
Silicon Monoxide Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
Other Information of Silicon Monoxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Silicon Monoxide Sputtering Targets
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Ceramic Sputtering Targets Silicon Dioxide Sputtering Target |
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Evaporation Materials Silicon Evaporation Pellet |
Crucibles Quartz Crucible |
Metal Powders N/A |
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