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Silicon Monoxide Sputtering Targets (SiO)

Silicon Monoxide Sputtering Targets (SiO)
Material Type Silicon (II) Oxide
Symbol SiO
Melting Point (°C) >1,702
Theoretical Density (g/cc) 2.13
Z Ratio 0.87
Sputter RF, RF-R
Type of Bond Indium, Elastomer
Comments For resistance evaporation, use baffle box and low rate.

General

Silicon monoxide is the chemical compound with the formula SiO where silicon is present in the oxidation state +2. In the vapour phase it is a diatomic molecule.

Material Notes

Silicon Monoxide Sputtering Target, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 



Other Information of Silicon Monoxide Sputtering Targets

Applications
  Ferroelectric
• Gate Dielectric

• For CMOS

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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