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AEM Deposition

Lanthanum Titanate Sputtering Targets (LaTiO3)

Lanthanum Titanate Sputtering Targets (LaTiO3)
Lanthanum Titanate Sputtering Targets (LaTiO3)Lanthanum Titanate Sputtering Targets (LaTiO3)
Material Type Lanthanum Titanate
Symbol LaTiO3
Color/Appearance Various colors, Solid
Melting Point (°C) N/A
Relative Density (g/cc) >90%
Z Ratio N/A
Sputter RF, RF-R, DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer


Lanthanum Titanate (LaTiO3) has perovskite crystalline structure. LaTiO3 has been suggested to have promising scientific and technological applications, such as in electronic transducers, thin film capacitors, computer memory cells.

Material Notes

Lanthanum Titanate Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness <= 15 mm; Block: Length <= 120 +/-0.1 mm, Width <= 120 +/-0.1 mm,Thickness <= 15 mm. 

Other Information of Lanthanum Titanate Sputtering Targets

• Thermal barrier, catalyst
• Superconducting, solid oxide fuel cell

• Super capacitor
• Electromagnetic device

• High purity & Density
• Custom Sizes Available
• Single Phase 
• Relative Density: >=85%

Manufacturing Process
•  In-house powder synthesis, High purity metal oxide precursor materials, High energy mixing, Particle sizing processes
• Multiple step densification, Proprietary processes employed for pressing and sintering
• Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment
99.9% Minimum Purity

• Custom compositions may be available upon request

• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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