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Titanium Monoxide Sputtering Targets (TiO)

Titanium Monoxide Sputtering Targets (TiO)
Material Type Titanium Monoxide
Symbol TiO
Color/Appearance Bronze crystals
Melting Point (°C) 1750
Theoretical Density (g/cc) 4.95
Max Power Density*(Watts/Square Inch) 20
Sputte RF
Type of Bond Indium, Elastomer
Comments Preheat gently to outgas

General

Titanium(II) oxide (TiO) is an inorganic chemical compound of titanium and oxygen. It can be prepared from titanium dioxide and titanium metal at 1500°C. AEM specializes in producing high purity uniform shaped Titanium Monoxide (Titanium(II) Oxide) Tablets with the highest possible density and smallest possible average grain sizes.


Material Notes

Titanium Monoxide Sputtering Target, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

 
 


Other Information of Titanium Monoxide Sputtering Targets

Applications
  Ferroelectric
• Gate Dielectric

• For CMOS

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99.9% ex Strontium Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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