List of Sputtering Targets for Flat Panel Display Coating
At present, the demand for flat panel display devices such as portable personal computers, televisions and mobile phones is growing rapidly, which greatly promotes the development of various flat panel display devices. Furthermore, the demand of sputtering target materials for planar display is increasing rapidly.
Type of flat panel display
Flat panel display consists of metal electrode, transparent conducting electrode, insulating layer and luminous layer. It includes liquid crystal display device (LCD), plasma display device (PDP), thin film transistor liquid crystal flat panel display (TFT-LCD), etc. These flat panel display devices all need to use various types of thin films. Without the thin film technology, there will be no flat panel display devices.
Sputtering target for flat panel display
In order to ensure the uniformity of large area film, improve productivity and reduce cost, sputtering technology is more and more used to prepare flat panel display film. The sputtering targets for flat display coating
mainly include Cr sputtering target, Mo sputtering target, Al sputtering target, Al alloy sputtering target, Cu sputtering target, Cu alloy sputtering target and ITO sputtering target. The details are as follows:
Chromium Sputtering Target
Chromium sputtering targets are widely used in hardware tool coating, decorative coating and Flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping, ...).The thickness of the film is generally 2~10um, and the film requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion porperty. Now, chromium sputtering targets are common applicated in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
Molybdenum Sputtering Target
Molybdenum is a silvery-grey metal with a Mohs hardness of 5.5. It has a melting point of 2,623 °C (4,753 °F); of the naturally occurring elements, only tantalum, osmium, rhenium, tungsten, and carbon have higher melting points. Weak oxidation of molybdenum starts at 300 °C (572 °F). It has one of the lowest coefficients of thermal expansion among commercially used metals. The tensile strength of molybdenum wires increases about 3 times, from about 10 to 30 GPa, when their diameter decreases from ~50–100 nm to 10 nm.
Aluminum Sputtering Target
Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and the popular aluminum foil food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and is able to form an oxide layer that is resistant to corrosion. When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. Aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in semiconductor chip, flat panel display, solar cell industries.
Copper Sputtering Target
Copper is a ductile metal with very high thermal conductivity, electrical conductivity, ductility, corrosion resistance. A freshly exposed surface of pure copper has a reddish-orange color. High-purity copper is used as various wires in the electronics industry, bonding wires for electronic packaging, high-quality audio cables and integrated circuits, liquid crystal display sputtering targets, and ion plating. It is also an indispensable valuable material in atomic energy, rockets, missiles, aviation, space navigation, and metallurgical industries. AEM can provide high purity OFC, Cupronickel and alloy products as you requested.
ITO Sputtering Target
Indium Tin Oxide (ITO) sputtering target is widely used in the formation of electrically transparent thin films, which adopt direct current magnetron sputtering process for electrodes in flat panel displays, solar cells, gas sensors and so on. In order to improve ITO thin film property, ITO sputtering target requires high purity, homogeneous microstructure, high density and high electrical conductivity. ITO sputtering targets were fabricated using In2O3-SnO2 mixed powders and tin doped indium oxide powders.
Aluminum Copper Sputtering Target
AEM Deposition specializes in producing high purity Aluminum Copper (Al/Cu) Sputtering Targets with the highest possible density. High Purity (99.9%) Aluminum Copper Sputtering Targets with smallest possible average grain sizes can be used for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Aluminum Neodymium Sputtering Target
AEM Deposition specializes in producing high purity Aluminum Neodymium (Al/Nd) Sputtering Targets with the highest possible density. High Purity (99.9%) Aluminum Neodymium Sputtering Targets with smallest possible average grain sizes can be used for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Aluminum Scandium Sputtering Target
Aluminum Silicon Copper Sputtering Target
Copper Silver Sputtering Target
Copper Zinc Sputtering Target
Gold Copper Sputtering Target
AEM deposition, as a sputtering target manufacturer
, we provide not only sputtering targets for glass, but also sputtering targets for other fields. Such as pure metal sputtering target, alloy sputtering target, ceramic oxide sputtering target and so on. The details are as follows:
Interested friends can click the relevant links to specific product pages. You can also contact us directly by email.E-mail: [email protected]