List of Sputtering Targets for Flat Panel Display Coating
At present, the demand for Flat-panel display devices such as portable personal computers, televisions, and mobile phones is multiplying, which significantly promotes the development of various flat-panel display devices. Furthermore, the demand for sputtering target materials for planar display is increasing rapidly.
Type of Flat-panel Display
The flat-panel display consists of a metal electrode, transparent conducting electrode, the insulating layer, and luminous layer. It includes a liquid crystal display (LCD), plasma display device (PDP), thin-film transistor liquid crystal flat-panel display (TFT-LCD). These flat-panel display devices all use various types of thin-films. Without the thin-film technology, there will be no flat-panel display devices
Sputtering target for flat panel display
To ensure large-area film's uniformity, improve productivity and reduce cost, sputtering technology is more and more used to prepare Flat-panel display film. The sputtering targets for flat display coating mainly include Cr sputtering target, Mo sputtering target, Al sputtering target, Al alloy sputtering target, Cu sputtering target, Cu alloy sputtering target, and ITO sputtering target. Further details are as follows:
Chromium Sputtering Target
Chromium sputtering targets are widely used in hardware tool coating, decorative coating, and flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping). The film's thickness is generally 2~10um, and it requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion property. Now, chromium sputtering targets are commonly applied in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
Molybdenum Sputtering Target
Molybdenum is a silvery-grey metal with a Mohs hardness of 5.5. Its melting point is 2,623 °C (4,753 °F). Only tantalum, osmium, rhenium, tungsten, and carbon have higher melting points between the naturally occurring elements. Weak oxidation of molybdenum starts at 300 °C (572 °F). It has one of the lowest coefficients of thermal expansion among commercially used metals. Molybdenum wires' tensile strength increases about three times, from about 10 to 30 GPa, when their diameter decreases from ~50–100 nm to 10 nm.
Aluminum Sputtering Target
Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and aluminum foil in food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and can form an oxide layer resistant to corrosion. If evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, flat panel display, and solar cell industries.
Copper Sputtering Target
Copper is a ductile metal with very high thermal conductivity, electrical conductivity, ductility, corrosion resistance. A freshly exposed surface of pure copper has a reddish-orange color. High-purity copper is used as various wires in the electrical and electronics industry, bonding wires for electronic packaging, high-quality audio cables and integrated circuits, liquid crystal display sputtering targets, and ion plating. It is also an indispensable valuable material in atomic energy, rockets, missiles, aviation, space navigation, and metallurgical industries. AEM offers high purity OFC, Cupronickel, and alloy products as per requirement.
ITO Sputtering Target
Indium Tin Oxide (ITO) sputtering target is widely used to form electrically transparent thin films. These films adopt direct current magnetron sputtering processes for electrodes in flat panel displays, solar cells, gas sensors, and so on. ITO sputtering target requires high purity, homogeneous microstructure, high density, and high electrical conductivity to improve ITO thin film property. ITO sputtering targets are being fabricated using In2O3-SnO2 mixed powders and tin-doped indium oxide powders.
Aluminum Copper Sputtering Target
AEM Deposition specializes in producing high purity Aluminum Copper (Al/Cu) Sputtering Targets with the highest possible density. High purity (99.9%) Aluminum Copper Sputtering Targets with the smallest possible average grain sizes can be used for semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Aluminum Neodymium Sputtering Target
AEM Deposition specializes in producing high purity Aluminum Neodymium (Al/Nd) Sputtering Targets with the highest possible density. High purity (99.9%) Aluminum Neodymium Sputtering Targets with the smallest possible average grain sizes can be used for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Aluminum Scandium Sputtering Target
Aluminum Silicon Copper Sputtering Target
Copper Silver Sputtering Target
Copper Zinc Sputtering Target
Gold Copper Sputtering Target
AEM Deposition, as a sputtering target manufacturer, we provide not only sputtering targets for glass but also sputtering targets for other fields. Such as pure metal sputtering target, alloy sputtering target, ceramic oxide sputtering target and so on. Further details are as follows:
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