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  • List of Sputtering Targets for Thermally Reflective Automobile Glass

    views, Updated: 2021-09-13
    Thermal reflective coated glass is also known as sunshine control coated glass and commonly known as coated glass, refers to the coated glass with the function of reflecting solar energy. Generally, by coating metal or metal oxide film on the glass surface, a large number of solar radiation and light can be reflected.
     
    Heat Reflecting Glass
    The heat-reflecting glass has good performance of shading and heat insulation. In recent years, heat-reflective coated glass has been widely used in hotels, restaurants, and commercial places. With the increasingly major energy-saving problem, the heat reflective glass has also been used in residential buildings.
     
    Heat Reflecting Automobile Glass
    The heat reflection coated glass can effectively reflect the infrared light of the sun (20-25%), block the heat from entering the vehicle (heat insulation performance > 30%), reduce the air conditioning load, maintain good light transmittance (70-75%), and maintain a clear vision. Therefore, the demand for sputtering target materials for thermal reflective coated glass is increasing.
     
    List of Sputtering Targets for Thermally Reflective Coated Glass
    Which sputtering targets can be used for thermal reflective coating? At present, the commonly used sputtering targets for automobile glass coating are Cr, Fe, Sn, Si, Zn, Mn, Ti, Al, Ag, Ni, Ni / Cr, Cu, Ni / Cu, and other sputtering targets of different specifications, as follows:
     
    Chromium Sputtering Target
    Chromium sputtering targets are widely used in hardware tool coating, decorative coating, and flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping). The film's thickness is generally 2~10um, and it requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion property. Now, chromium sputtering targets are commonly applied in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
     
      Name   Chromium sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/chromium-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.5-99.95%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Tin Sputtering Target
    Tin is a soft, malleable, ductile, and highly crystalline silvery-white metal. When a bar of tin is bent, a crackling sound is known as the "tin cry" can be heard from the crystals' twinning. Tin melts at a low temperature of about 232  ℃(450 ℉), the lowest in group 14. The melting point is further lowered to 177.3 ℃(351.1 ℉) for 11 nm par.
     
      Name   Tin sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/tin-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Silicon Sputtering Target
    Silicon sputtering targets mainly used in reactive magnetron sputtering to deposit dielectric layers, such as SiO2 and SiN. As an essential functional film material, they have good hardness, optical, dielectric properties, and wear resistance. Si targets' corrosion resistance has broad application prospects in optical and microelectronics fields and is currently widely used as functional materials globally. Now, it is mainly used for LCD transparent conductive glass, architectural LOW-E glass, and the microelectronics industry. The silicon sputtering targets can be divided into two types: single crystal and polycrystalline. We produce planar silicon sputtering targets through the Czochralski crystal growth method.
     
      Name   Silicon sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/silicon-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99%, 99.999%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Zinc Sputtering Target
    Zinc is a bluish-white, lustrous, diamagnetic metal, though most common commercial grades of the metal have a dull finish. It is somehow less dense than iron and has a hexagonal crystal structure, with a distorted form of close hexagonal packing. At the same time, each atom has six nearest neighbors (at 265.9 pm) in its plane and six others at a greater distance of 290.6 pm. The metal is hard and brittle at most temperatures but becomes malleable between 100 and 150 ℃. Above 210 ℃, the metal becomes brittle again and can be pulverized by beating. Zinc is a fair conductor of electricity. For a metal, zinc has relatively low melting (419.5 ℃) and boiling points (90).
     
      Name   Zinc sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/zinc-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99, 99.995%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Manganese Sputtering Target
    Manganese is a chemical element with the symbol Mn and atomic number 25. It is not found as a free element in nature; it is often found in minerals combined with iron. Manganese is a metal with significant industrial metal alloy usage, particularly in stainless steel. Manganese is a silvery-gray metal that resembles iron. It is hard and very brittle, difficult to fuse, but easy to oxidize. Manganese metal and its common ions are paramagnetic. Manganese tarnishes slowly in air and oxidizes ("rusts") like iron in water containing dissolved oxygen.
     
      Name   Manganese sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/manganese-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.9%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Titanium Sputtering Target
    Titanium sputtering targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is one of the core materials for preparing integrated circuits, and purity usually requires over 99.99%. AEM offers Titanium alloy targets such as Tungsten Titanium (W/Ti 90/10 wt%) sputtering target, an essential material for the semiconductor and solar industry. The W/Ti sputtering target density can reach over 14.24 g/cm3, and the purity can reach 99.995%.
     
      Name   Titanium sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/titanium-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.9-99.999%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Aluminum Sputtering Target
    Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and aluminum foil in food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and can form an oxide layer resistant to corrosion.  If evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, flat panel display, and solar cell industries.
     
      Name   Aluminum sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/aluminum-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99-99.9995%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Silver Sputtering Target
    Silver is a soft, lustrous element that belongs to the metals' transition group on the periodic table. It has a melting point of 962 ℃, a density of 10.5 g/cc, and vapor pressure of 10-4 Torr at 1,105 ℃. Silver has been used since ancient times in countless products. It is ductile, malleable, and the most electrically conductive of all metals. It is considered a precious metal and can be found in jewelry, solders, paints, and mirrors. It is evaporated under vacuum to produce semiconductors, sensors, fuel cells, and optical coatings
     
      Name   Silver sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/silver-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Nickel Sputtering Target
    Nickel is a silvery-white lustrous metal with a slight golden tinge. It is widely used in the production of sponge nickel and decorative coatings. Nickel can form a decorative coating on ceramic surfaces or a solder layer in-circuit device fabrication when evaporated in a vacuum. It is often sputtered to create layers in magnetic storage media, fuel cells, and sensors. AEM offers nickel sputtering targets with high-purity and fine grain. Under the same conditions, the coating film is more uniform than similar products, and the coating area is increased by 10% to 20%.
     
      Name   Nickel sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/nickel-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.9%, 99.96%, 99.99%, 99.995%, 99.999%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Nickel Chromium Sputtering Target
     
      Name   Nickel chromium sputtering target   Product link   https://www.aemdeposition.com/alloy-targets/nickel-chromium-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.9%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Copper Sputtering Target
    Copper is a ductile metal with very high thermal conductivity, electrical conductivity, ductility, corrosion resistance. A freshly exposed surface of pure copper has a reddish-orange color. High-purity copper is used as various wires in the electrical and electronics industry, bonding wires for electronic packaging, high-quality audio cables and integrated circuits, liquid crystal display sputtering targets, and ion plating. It is also an indispensable valuable material in atomic energy, rockets, missiles, aviation, space navigation, and metallurgical industries. AEM offers high purity OFC, Cupronickel, and alloy products as per requirement.
     
      Name   Copper sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/copper-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99-99.9999%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Nickel Copper Sputtering Target
     
      Name   Nickel copper sputtering target   Product link   https://www.aemdeposition.com/alloy-targets/
      Brand   AEM Deposition   Purity   99.9-99.999%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

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