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AEM Deposition

Lanthanum Nickel Oxide Sputtering Targets (LaNiO3)

Lanthanum Nickel Oxide Sputtering Targets (LaNiO3)
Lanthanum Nickel Oxide Sputtering Targets (LaNiO3)
Material Type Lanthanum Nickel Oxide
Symbol LaNiO3
Color/Appearance Various colors, Solid
Melting Point (°C) N/A
Relative Density (g/cc) >90%
Z Ratio N/A
Sputter RF, RF-R, DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer


The recent theoretical prediction for superconductivity in LaNiO3 thin films has also triggered intensive research efforts. LaNiO3 seems to be the only rare earth nickelate that stays metallic and paramagnetic down to lowest temperatures. The LaNiO3 thin flims are good materials used in Catalyst, Spuerconducting, Solid oxide fuel cell cathode, super capacitor.

Material Notes

Lanthanum Nickel Oxide Sputtering Targets, Purity is 99.9%;Circular: Circular: Diameter <= 14inch, Thickness <= 15 mm; Block: Length <= 120 +/-0.1 mm, Width <= 120 +/-0.1 mm,Thickness <= 15 mm. 

Other Information of Lanthanum Nickel Oxide Sputtering Targets


• Catalyst
• Superconducting, solid oxide fuel cell cathode

• Super capacitor
• Ferroelectric storage

• High purity & Density
• Custom Sizes Available
• Single Phase 


Manufacturing Process
•  In-house powder synthesis, High purity metal oxide precursor materials, High energy mixing, Particle sizing processes
• Multiple step densification, Proprietary processes employed for pressing and sintering
• Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment
• 99.9% Minimum Purity

• Custom compositions may be available upon request

• Smaller sizes also available for R&D applications
• Sputtering target bonding service

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