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Zinc Telluride Sputtering Targets (ZnTe)

Zinc Telluride Sputtering Targets (ZnTe)
Material Type Zinc Telluride
Symbol ZnTe
Color/Appearance Red, Crystalline Solid
Melting Point (°C) 1,239
Theoretical Density (g/cc) 6.34
Z Ratio 0.77
Sputter RF
Type of Bond Indium, Elastomer
UN Number 3284
Comments Preheat gently to outgas.

General

Zinc telluride is a binary chemical compound with the formula ZnTe. This solid is a semiconductor material with a direct band gap of 2.26 eV. It is usually a P-type semiconductor. Its crystal structure is cubic, like that for sphalerite and diamond.


Material Notes

Zinc Telluride Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
 



Other Information of Zinc Telluride Sputtering Targets

Applications
 Semiconductor
• Chemical vapor deposition (CVD)
• Physical vapor deposition (PVD) display

Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade


Manufacturing Process
Refining
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment

Options
99.999% minimum purity
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service

 

 

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