AZO Sputtering Target (Alumina Doped Zinc Oxide) is a transparent conductive oxide commonly used as a transparent electrode for solar photovoltaic applications and in large area architectural glass coating. AEM offers high purity (99.95%), high density (> 99%), and low resistivity AZO targets in rotatable form.
Deposition Procedure of AZO Sputtering Targets
It depends on the process. AZO films can be deposited by RF or DC magnetron sputtering, but not by thermal evaporation. If the sputtering target is non-conducting, as with a ceramic composition, RF sputter techniques are necessary. Otherwise, reactive DC magnetron sputtering is preferred.
Target power density ~3-4 W/cm2 with an O2 to Ar flow rate ~2:1.
Operating total pressure ~6 mTorr.
Substrate temperature near 200° C.
Higher power and greater thicknesses produce lower sheet resistances.