Copper Substrate (Cu)
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Copper Substrate
Copper (Cu) single crystal substrate is widely used in matrix metals, alloy film materials, and biomaterials.
Copper Substrate Physical Properties
Material | Copper |
---|---|
Crystal Structure | M3 |
Growth Method | Bridgman Method |
Lattice (A) | a=3.607 |
Density(g/cm3) | Dx=8.989(g/cm3);Dm=8.95(g/cm3) |
Purity | >4N |
Melting Point | 1083℃ |
Copper Substrate Specifications
Size | 10x3, 10x5, 10x10, 15x15, 20x15, 20x20 |
---|---|
Customized sizes are available on demand. | |
Thickness | 0.5 mm, 1.0 mm |
Crystal Orientation | <100> <110> <111> |
Polished | SSP or DSP |
Redirection Precision | ±0.5° |
Redirection the Edge | 2°(special in 1°) |
Angle of Crystalline | Customized sizes are available on demand. |
Ra: | ≤5Å(5µm×5µm) |
Copper Substrate Package
Packaged with class 100 clean bag or wafer container in a class 1000 clean room.
Related Products of Copper Substrate
Magnetic Ferroelectricity Substrates |
Semiconductor Wafers |
|
GaN Thin Film Substrates |
Halide Substrates |
Ceramic Substrates |
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